基于气压约束流场的电化学沉积技术研究*
王鹏举, 李国栋, 陶湛, 薛云峰, 王震宇, 刘禹
Study of electrochemical deposition based on the control of flowing field by air pressure
WANG Pengju, LI Guodong, TAO Zhan, XUE Yunfeng, WANG Zhenyu, LIU Yu
现代制造工程
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2025, (11): 87
-93
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DOI: 10.16731/j.cnki.1671-3133.2025.11.012